METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD, CONTROL SYSTEM FOR A LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS

In a method of controlling a lithographic apparatus, historical performance measurements are used to calculate a process model relating to a lithographic process. Current positions of a plurality of alignment marks provided on a current substrate are measured and used to calculate a substrate model...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	VAN DONKELAAR, Ingrid Margaretha Ardina, HULSEBOS, Edo Maria, VERHEES, Loek Johannes Petrus, LUCAS, Jorn Kjeld, TINNEMANS, Patricius Aloysius Jacobus, BIJNEN, Franciscus Godefridus Casper, BRINKHOF, Ralp, HERES, Pieter Jacob
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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