METHOD TO OPERATE AN APPARATUS FOR FEEDING LIQUID METAL TO AN EVAPORATOR DEVICE

A method to operate an apparatus for feeding liquid metal to an evaporator device in a vacuum chamber, wherein the feed tube runs from a container adapted to contain a liquid metal to the evaporator device and wherein an electromagnetic pump is provided in the feed tube and a valve in the feed tube...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ZOESTBERGEN, Edzo, HAZELETT, Peter William, WIDDIS, Stephen James, COMMANDEUR, Colin, BAKKER, Eduard Paul Mattheus, KAISER, Timothy Dean, HAMILTON, Douglas Alexander, SNIJDERS, Roland Jan
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CONVERSION OR DISTRIBUTION OF ELECTRIC POWER DIFFUSION TREATMENT OF METALLIC MATERIAL DYNAMO-ELECTRIC MACHINES ELECTRICITY GENERATION INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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