GAMMA GROOVE ARRAYS FOR INTERCONNECTING AND MOUNTING DEVICES
Devices with gamma (γ) grooves are disclosed. The γ grooves can be used to form optical fiber arrays. The γ grooves can be formed using a dry etch, such as RIE, by modifying resist features of an etch mask to have convex curved sidewalls. The profile of the resist features is transferred to the subs...
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| creator | LAM, Jeffrey C LIU, Bo HUANG, Yamin MAI, Zhihong |
| description | Devices with gamma (γ) grooves are disclosed. The γ grooves can be used to form optical fiber arrays. The γ grooves can be formed using a dry etch, such as RIE, by modifying resist features of an etch mask to have convex curved sidewalls. The profile of the resist features is transferred to the substrate by the dry etch to form the γ grooves. The γ grooves are formed without K containing etchants, avoiding K+ ions contamination of process tools as well as health issues caused by handling alkali containing devices. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2019204525A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2019204525A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2019204525A13</originalsourceid><addsrcrecordid>eNrjZLBxd_T1dVRwD_L3D3NVcAwKcowMVnDzD1Lw9AtxDXL29_NzdQ7x9HNXcPRzUfD1D_UDc1xcwzydXYN5GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakl8aLCRgaGlkYGJqZGpo6ExcaoAtJMqkg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>GAMMA GROOVE ARRAYS FOR INTERCONNECTING AND MOUNTING DEVICES</title><source>esp@cenet</source><creator>LAM, Jeffrey C ; LIU, Bo ; HUANG, Yamin ; MAI, Zhihong</creator><creatorcontrib>LAM, Jeffrey C ; LIU, Bo ; HUANG, Yamin ; MAI, Zhihong</creatorcontrib><description>Devices with gamma (γ) grooves are disclosed. The γ grooves can be used to form optical fiber arrays. The γ grooves can be formed using a dry etch, such as RIE, by modifying resist features of an etch mask to have convex curved sidewalls. The profile of the resist features is transferred to the substrate by the dry etch to form the γ grooves. The γ grooves are formed without K containing etchants, avoiding K+ ions contamination of process tools as well as health issues caused by handling alkali containing devices.</description><language>eng</language><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; PHYSICS</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190704&DB=EPODOC&CC=US&NR=2019204525A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190704&DB=EPODOC&CC=US&NR=2019204525A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LAM, Jeffrey C</creatorcontrib><creatorcontrib>LIU, Bo</creatorcontrib><creatorcontrib>HUANG, Yamin</creatorcontrib><creatorcontrib>MAI, Zhihong</creatorcontrib><title>GAMMA GROOVE ARRAYS FOR INTERCONNECTING AND MOUNTING DEVICES</title><description>Devices with gamma (γ) grooves are disclosed. The γ grooves can be used to form optical fiber arrays. The γ grooves can be formed using a dry etch, such as RIE, by modifying resist features of an etch mask to have convex curved sidewalls. The profile of the resist features is transferred to the substrate by the dry etch to form the γ grooves. The γ grooves are formed without K containing etchants, avoiding K+ ions contamination of process tools as well as health issues caused by handling alkali containing devices.</description><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLBxd_T1dVRwD_L3D3NVcAwKcowMVnDzD1Lw9AtxDXL29_NzdQ7x9HNXcPRzUfD1D_UDc1xcwzydXYN5GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakl8aLCRgaGlkYGJqZGpo6ExcaoAtJMqkg</recordid><startdate>20190704</startdate><enddate>20190704</enddate><creator>LAM, Jeffrey C</creator><creator>LIU, Bo</creator><creator>HUANG, Yamin</creator><creator>MAI, Zhihong</creator><scope>EVB</scope></search><sort><creationdate>20190704</creationdate><title>GAMMA GROOVE ARRAYS FOR INTERCONNECTING AND MOUNTING DEVICES</title><author>LAM, Jeffrey C ; LIU, Bo ; HUANG, Yamin ; MAI, Zhihong</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2019204525A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2019</creationdate><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>LAM, Jeffrey C</creatorcontrib><creatorcontrib>LIU, Bo</creatorcontrib><creatorcontrib>HUANG, Yamin</creatorcontrib><creatorcontrib>MAI, Zhihong</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LAM, Jeffrey C</au><au>LIU, Bo</au><au>HUANG, Yamin</au><au>MAI, Zhihong</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>GAMMA GROOVE ARRAYS FOR INTERCONNECTING AND MOUNTING DEVICES</title><date>2019-07-04</date><risdate>2019</risdate><abstract>Devices with gamma (γ) grooves are disclosed. The γ grooves can be used to form optical fiber arrays. The γ grooves can be formed using a dry etch, such as RIE, by modifying resist features of an etch mask to have convex curved sidewalls. The profile of the resist features is transferred to the substrate by the dry etch to form the γ grooves. The γ grooves are formed without K containing etchants, avoiding K+ ions contamination of process tools as well as health issues caused by handling alkali containing devices.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS |
| title | GAMMA GROOVE ARRAYS FOR INTERCONNECTING AND MOUNTING DEVICES |
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