SEMICONDUCTOR DEVICE WITH DEEP DIFFUSION REGION

A method of processing a semiconductor device, comprising: providing a semiconductor body having dopants of a first conductivity type; forming at least one trench that extends into the semiconductor body along a vertical direction, the trench being laterally confined by two trench sidewalls and vert...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: IRSIGLER, Peter, WUEBBEN, Thomas, SCHULZE, Hans-Joachim
Format: Patent
Sprache:eng
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