SYSTEM AND METHOD FOR PRODUCING AN OPTICAL MASK FOR SURFACE MICROTEXTURING, AND SURFACE MICROTEXTURING PLANT AND METHOD

The invention relates to a system (2) for producing an optical mask (35) for surface microtexturing, said system (2) comprising: a substrate (10) having a surface (11) that is to be textured; a layer of material (20) which covers the surface (11) of the substrate (10) and has an outer surface (21) t...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	DUBOST, Laurent, JOURLIN, Yves, BICHOTTE, Maxime
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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