METHOD OF FORMING SEMICONDUCTOR DEVICE

A method of forming a semiconductor memory device includes following steps. First of all, a target layer is provided, and a mask structure is formed on the target layer, with the mask structure including a first mask layer a sacrificial layer and a second mask layer. The first mask layer and the sec...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Lee, Fu-Che, Chang, Feng-Yi, Liu, Wei-Hsin, Lee, Jui-Min, Lin, Ying-Chih, Lin, Gang-Yi
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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