Lithographic Method and Apparatus

A lithographic method for measuring a position of a target grating with a mask sensor apparatus which comprises a plurality of detector modules each comprising a diffraction grating located at a mask side of a projection system of a lithographic apparatus and an associated detector, the method compr...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	VAN DEN HOMBERG, Johannes Aidegonda Theodorus Marie, SCHOORMANS, Carolus Johannes Catharina, VAN DER PASCH, Engelbertus Antonius Fransiscus, SLADKOV, Maksym Yurllovych, BASELMANS, Johannes Jacobus Matheus, PADIY, Alexander Viktorovych, BROUNS, Andreas Johannes Antonius
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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