ETCHANT AND METHOD OF MANUFACTURING DISPLAY DEVICE BY USING THE SAME

An etchant includes: based on a total weight of the etchant, about 1 wt % to about 15 wt % of sulfurized peroxide, about 5 wt % to about 10 wt % of nitric acid, about 20 wt % to about 40 wt % of organic acid, about 0.05 wt % to about 5 wt % of ferric nitrate, about 0.1 wt % to about 5 wt % of ionic...

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Hauptverfasser:	KIM, Sangtae, YOON, Youngjin, PARK, Jonghee, KIM, Jinseock, KIM, Kitae, KIM, Beomsoo, SHIM, Kyungbo, NAM, Giyong, LIM, Daesung
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES SEMICONDUCTOR DEVICES
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creator	KIM, Sangtae YOON, Youngjin PARK, Jonghee KIM, Jinseock KIM, Kitae KIM, Beomsoo SHIM, Kyungbo NAM, Giyong LIM, Daesung
description	An etchant includes: based on a total weight of the etchant, about 1 wt % to about 15 wt % of sulfurized peroxide, about 5 wt % to about 10 wt % of nitric acid, about 20 wt % to about 40 wt % of organic acid, about 0.05 wt % to about 5 wt % of ferric nitrate, about 0.1 wt % to about 5 wt % of ionic sequestrant, and 0.1 wt % to 5 wt % of corrosion inhibitor, wherein a remaining amount is deionized water.
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fullrecord	<record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2019153318A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2019153318A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2019153318A13</originalsourceid><addsrcrecordid>eNrjZHBxDXH2cPQLUXD0c1HwdQ3x8HdR8HdT8HX0C3VzdA4JDfL0c1dw8QwO8HGMVHBxDfN0dlVwilQIDQaJh3i4KgQ7-rryMLCmJeYUp_JCaW4GZTeQubqpBfnxqcUFicmpeakl8aHBRgaGloamxsaGFo6GxsSpAgDZRixT</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ETCHANT AND METHOD OF MANUFACTURING DISPLAY DEVICE BY USING THE SAME</title><source>esp@cenet</source><creator>KIM, Sangtae ; YOON, Youngjin ; PARK, Jonghee ; KIM, Jinseock ; KIM, Kitae ; KIM, Beomsoo ; SHIM, Kyungbo ; NAM, Giyong ; LIM, Daesung</creator><creatorcontrib>KIM, Sangtae ; YOON, Youngjin ; PARK, Jonghee ; KIM, Jinseock ; KIM, Kitae ; KIM, Beomsoo ; SHIM, Kyungbo ; NAM, Giyong ; LIM, Daesung</creatorcontrib><description>An etchant includes: based on a total weight of the etchant, about 1 wt % to about 15 wt % of sulfurized peroxide, about 5 wt % to about 10 wt % of nitric acid, about 20 wt % to about 40 wt % of organic acid, about 0.05 wt % to about 5 wt % of ferric nitrate, about 0.1 wt % to about 5 wt % of ionic sequestrant, and 0.1 wt % to 5 wt % of corrosion inhibitor, wherein a remaining amount is deionized water.</description><language>eng</language><subject>ADHESIVES ; BASIC ELECTRIC ELEMENTS ; CHEMISTRY ; DYES ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; PAINTS ; POLISHES ; SEMICONDUCTOR DEVICES</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190523&DB=EPODOC&CC=US&NR=2019153318A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190523&DB=EPODOC&CC=US&NR=2019153318A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KIM, Sangtae</creatorcontrib><creatorcontrib>YOON, Youngjin</creatorcontrib><creatorcontrib>PARK, Jonghee</creatorcontrib><creatorcontrib>KIM, Jinseock</creatorcontrib><creatorcontrib>KIM, Kitae</creatorcontrib><creatorcontrib>KIM, Beomsoo</creatorcontrib><creatorcontrib>SHIM, Kyungbo</creatorcontrib><creatorcontrib>NAM, Giyong</creatorcontrib><creatorcontrib>LIM, Daesung</creatorcontrib><title>ETCHANT AND METHOD OF MANUFACTURING DISPLAY DEVICE BY USING THE SAME</title><description>An etchant includes: based on a total weight of the etchant, about 1 wt % to about 15 wt % of sulfurized peroxide, about 5 wt % to about 10 wt % of nitric acid, about 20 wt % to about 40 wt % of organic acid, about 0.05 wt % to about 5 wt % of ferric nitrate, about 0.1 wt % to about 5 wt % of ionic sequestrant, and 0.1 wt % to 5 wt % of corrosion inhibitor, wherein a remaining amount is deionized water.</description><subject>ADHESIVES</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMISTRY</subject><subject>DYES</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>PAINTS</subject><subject>POLISHES</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHBxDXH2cPQLUXD0c1HwdQ3x8HdR8HdT8HX0C3VzdA4JDfL0c1dw8QwO8HGMVHBxDfN0dlVwilQIDQaJh3i4KgQ7-rryMLCmJeYUp_JCaW4GZTeQubqpBfnxqcUFicmpeakl8aHBRgaGloamxsaGFo6GxsSpAgDZRixT</recordid><startdate>20190523</startdate><enddate>20190523</enddate><creator>KIM, Sangtae</creator><creator>YOON, Youngjin</creator><creator>PARK, Jonghee</creator><creator>KIM, Jinseock</creator><creator>KIM, Kitae</creator><creator>KIM, Beomsoo</creator><creator>SHIM, Kyungbo</creator><creator>NAM, Giyong</creator><creator>LIM, Daesung</creator><scope>EVB</scope></search><sort><creationdate>20190523</creationdate><title>ETCHANT AND METHOD OF MANUFACTURING DISPLAY DEVICE BY USING THE SAME</title><author>KIM, Sangtae ; YOON, Youngjin ; PARK, Jonghee ; KIM, Jinseock ; KIM, Kitae ; KIM, Beomsoo ; SHIM, Kyungbo ; NAM, Giyong ; LIM, Daesung</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2019153318A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2019</creationdate><topic>ADHESIVES</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMISTRY</topic><topic>DYES</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>PAINTS</topic><topic>POLISHES</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>KIM, Sangtae</creatorcontrib><creatorcontrib>YOON, Youngjin</creatorcontrib><creatorcontrib>PARK, Jonghee</creatorcontrib><creatorcontrib>KIM, Jinseock</creatorcontrib><creatorcontrib>KIM, Kitae</creatorcontrib><creatorcontrib>KIM, Beomsoo</creatorcontrib><creatorcontrib>SHIM, Kyungbo</creatorcontrib><creatorcontrib>NAM, Giyong</creatorcontrib><creatorcontrib>LIM, Daesung</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KIM, Sangtae</au><au>YOON, Youngjin</au><au>PARK, Jonghee</au><au>KIM, Jinseock</au><au>KIM, Kitae</au><au>KIM, Beomsoo</au><au>SHIM, Kyungbo</au><au>NAM, Giyong</au><au>LIM, Daesung</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ETCHANT AND METHOD OF MANUFACTURING DISPLAY DEVICE BY USING THE SAME</title><date>2019-05-23</date><risdate>2019</risdate><abstract>An etchant includes: based on a total weight of the etchant, about 1 wt % to about 15 wt % of sulfurized peroxide, about 5 wt % to about 10 wt % of nitric acid, about 20 wt % to about 40 wt % of organic acid, about 0.05 wt % to about 5 wt % of ferric nitrate, about 0.1 wt % to about 5 wt % of ionic sequestrant, and 0.1 wt % to 5 wt % of corrosion inhibitor, wherein a remaining amount is deionized water.</abstract><oa>free_for_read</oa></addata></record>
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subjects	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES SEMICONDUCTOR DEVICES
title	ETCHANT AND METHOD OF MANUFACTURING DISPLAY DEVICE BY USING THE SAME
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