HIGH PRESSURE STEAM ANNEAL PROCESSING APPARATUS

Apparatuses for annealing semiconductor substrates, such as a batch processing chamber, are provided herein. The batch processing chamber includes a chamber body enclosing an internal volume, a cassette moveably disposed within the internal volume and a plug coupled to a bottom wall of the cassette....

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SCHALLER, Jason M, CARLSON, Charles T, VOPAT, Robert Brent, FRANKLIN, Timothy J, WEBB, Aaron, BLAHNIK, Jeffrey Charles, BLAHNIK, David
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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