AMORPHOUS THIN METAL FILM

An amorphous thin film stack can include a first layer including a combination metals or metalloids including: 5 at % to in 90 at % of a metalloid; 5 at % to 90 at % of a first metal and a second metal independently selected from titanium, vanadium, chromium, iron, cobalt, nickel, niobium, molybdenu...

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Bibliographische Detailangaben
Hauptverfasser: Johnson, T. Stafford, Olsen, Kristopher, Long, Greg Scott, Pugliese, Roberto A, Wager, John, McGlone, John M, Abbott, Jr., James Elmer, Keszler, Douglas A, Stickel, William F
Format: Patent
Sprache:eng
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