Simulation-Assisted Wafer Rework Determination

Aspects of the disclosed technology relate to techniques for using hotspot simulation to make wafer rework decisions. Metrology data of photoresist patterns created based on a layout design for a circuit design by a photolithographic processing step are received during a lithographic process. Hotspo...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Adam, Konstantinos G, Shang, Shumay Dou, Sturtevant, John L
Format:	Patent
Sprache:	eng
Schlagworte:	CALCULATING COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING PHYSICS
Online-Zugang:	Volltext bestellen
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