High Performance Water Based Fluid
A fluid may include an aqueous based continuous phase, a pH adjusting additive, wherein the pH adjusting additive is formic acid, and a clay hydration suppressant agent having the formula H2NCH(CH3)CH2(OCH(CH3)CH2)xNH2, wherein x is a value less than 15.
Gespeichert in:
| Hauptverfasser: | , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | Young, Steven Philip Stamatakis, Emanuel Riley, Meghan Ruth Chen, Yiyan |
| description | A fluid may include an aqueous based continuous phase, a pH adjusting additive, wherein the pH adjusting additive is formic acid, and a clay hydration suppressant agent having the formula H2NCH(CH3)CH2(OCH(CH3)CH2)xNH2, wherein x is a value less than 15. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2019071595A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2019071595A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2019071595A13</originalsourceid><addsrcrecordid>eNrjZFDyyEzPUAhILUrLL8pNzEtOVQhPLEktUnBKLE5NUXDLKc1M4WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8aHBRgaGlgbmhqaWpo6GxsSpAgAAzyZT</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>High Performance Water Based Fluid</title><source>esp@cenet</source><creator>Young, Steven Philip ; Stamatakis, Emanuel ; Riley, Meghan Ruth ; Chen, Yiyan</creator><creatorcontrib>Young, Steven Philip ; Stamatakis, Emanuel ; Riley, Meghan Ruth ; Chen, Yiyan</creatorcontrib><description>A fluid may include an aqueous based continuous phase, a pH adjusting additive, wherein the pH adjusting additive is formic acid, and a clay hydration suppressant agent having the formula H2NCH(CH3)CH2(OCH(CH3)CH2)xNH2, wherein x is a value less than 15.</description><language>eng</language><subject>ADHESIVES ; CHEMISTRY ; DYES ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; PAINTS ; POLISHES</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190307&DB=EPODOC&CC=US&NR=2019071595A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190307&DB=EPODOC&CC=US&NR=2019071595A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Young, Steven Philip</creatorcontrib><creatorcontrib>Stamatakis, Emanuel</creatorcontrib><creatorcontrib>Riley, Meghan Ruth</creatorcontrib><creatorcontrib>Chen, Yiyan</creatorcontrib><title>High Performance Water Based Fluid</title><description>A fluid may include an aqueous based continuous phase, a pH adjusting additive, wherein the pH adjusting additive is formic acid, and a clay hydration suppressant agent having the formula H2NCH(CH3)CH2(OCH(CH3)CH2)xNH2, wherein x is a value less than 15.</description><subject>ADHESIVES</subject><subject>CHEMISTRY</subject><subject>DYES</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>PAINTS</subject><subject>POLISHES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFDyyEzPUAhILUrLL8pNzEtOVQhPLEktUnBKLE5NUXDLKc1M4WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8aHBRgaGlgbmhqaWpo6GxsSpAgAAzyZT</recordid><startdate>20190307</startdate><enddate>20190307</enddate><creator>Young, Steven Philip</creator><creator>Stamatakis, Emanuel</creator><creator>Riley, Meghan Ruth</creator><creator>Chen, Yiyan</creator><scope>EVB</scope></search><sort><creationdate>20190307</creationdate><title>High Performance Water Based Fluid</title><author>Young, Steven Philip ; Stamatakis, Emanuel ; Riley, Meghan Ruth ; Chen, Yiyan</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2019071595A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2019</creationdate><topic>ADHESIVES</topic><topic>CHEMISTRY</topic><topic>DYES</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>PAINTS</topic><topic>POLISHES</topic><toplevel>online_resources</toplevel><creatorcontrib>Young, Steven Philip</creatorcontrib><creatorcontrib>Stamatakis, Emanuel</creatorcontrib><creatorcontrib>Riley, Meghan Ruth</creatorcontrib><creatorcontrib>Chen, Yiyan</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Young, Steven Philip</au><au>Stamatakis, Emanuel</au><au>Riley, Meghan Ruth</au><au>Chen, Yiyan</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>High Performance Water Based Fluid</title><date>2019-03-07</date><risdate>2019</risdate><abstract>A fluid may include an aqueous based continuous phase, a pH adjusting additive, wherein the pH adjusting additive is formic acid, and a clay hydration suppressant agent having the formula H2NCH(CH3)CH2(OCH(CH3)CH2)xNH2, wherein x is a value less than 15.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US2019071595A1 |
| source | esp@cenet |
| subjects | ADHESIVES CHEMISTRY DYES MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES |
| title | High Performance Water Based Fluid |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-10T12%3A53%3A59IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Young,%20Steven%20Philip&rft.date=2019-03-07&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2019071595A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |