LITHOGRAPHIC APPARATUS, METHOD FOR UNLOADING A SUBSTRATE AND METHOD FOR LOADING A SUBSTRATE

A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unload...

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Hauptverfasser: SCHEIBERLICH, Arie Cornelis, BALTIS, Coen Hubertus Matheus, SCHOLTEN, Bert Dirk, JEUNINK, Andre Bernardus, SCHREUDER, André, PACITTI, Evelyn Wallis, MARTENS, Robby Franciscus Josephus, DE VOS, Youssef Karel Maria, POIESZ, Thomas, VAN DORST, Ringo Petrus Cornelis, SENDEN, Dirk Jerome Andre, TEN BRINKE, Gerhard Albert, TROMP, Siegfried Alexander, GERRITZEN, Justin Johannes Hermanus, VAN DE VIJVER, Yuri Johannes Gabriël, KAMMINGA, Jelmer Mattheüs, SOETHOUDT, Abraham Alexander
Format: Patent
Sprache:eng
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Zusammenfassung:A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.