APPARATUS FOR COLLECTION AND SUBSEQUENT REACTION OF LIQUID AND SOLID EFFLUENT INTO GASEOUS EFFLUENT

Embodiments disclosed herein include an abatement system for abating compounds produced in semiconductor processes. The abatement system includes an exhaust cooling apparatus located downstream of a plasma source. The exhaust cooling apparatus includes a plate and a cooling plate disposed downstream...

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Bibliographische Detailangaben
Hauptverfasser: DOWNEY, Ryan T, L'HEUREUX, James, HOU, David Muquing, ROZENZON, Yan
Format: Patent
Sprache:eng
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