METHOD OF FORMING CARBON FILM

In a method of forming a carbon film of this invention, a target made of carbon is used, and in a state in which leakage magnetic field Mf is being functioned on a front surface side of the target, electric power is applied to the target to sputter, thereby forming a carbon film on a surface of a to...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	Itoh, Junichi, Kohari, Shinji, Henmi, Mitsunori, Fuse, Kazushi
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	In a method of forming a carbon film of this invention, a target made of carbon is used, and in a state in which leakage magnetic field Mf is being functioned on a front surface side of the target, electric power is applied to the target to sputter, thereby forming a carbon film on a surface of a to-be-processed object. At this time, a region for the leakage magnetic field to function on the target surface is made local, and the region for the leakage magnetic field to function is periodically changed by relatively moving the region relative to the target from an origin on the target surface back to the origin. Also, a product of an average magnetic field strength of the leakage magnetic field at a predetermined position on the target surface and applied electric power is kept below 125 G·kW.