ION IMPLANTER AND ION IMPLANTATION METHOD

An ion implanter includes a plasma shower device configured to supply electrons to an ion beam with which a wafer is irradiated. The plasma shower device includes a plasma generating chamber provided with an extraction opening, a first electrode which is provided with an opening communicating with t...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Ochi, Syuta, Ninomiya, Shiro, Kagawa, Tadanobu, Takahashi, Yuuji
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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