Charged Particle Beam Apparatus

An object of the invention is to provide a charged particle beam apparatus capable of achieving both acquisition of an image having high resolution of an inspection target pattern and suppression of a beam irradiation amount when a specific pattern is an inspection target from a highly integrated pa...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: UENO, Shinya, KOYAMA, Susumu, DONG, Shuangqi, HOQUE, Shahedul, NISHIHAMA, Hiroshi
Format: Patent
Sprache:eng
Schlagworte:
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