FILM FORMING APPARATUS, FILM FORMING METHOD, AND STORAGE MEDIUM

A film forming apparatus includes: a film forming gas discharge part; an exhaust port; a rotation mechanism; a heating part configured to heat the interior of a reaction container to a temperature lower than a temperature of a film forming gas discharged from the film forming gas discharge part; fir...

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Bibliographische Detailangaben

Hauptverfasser:	FUJIKAWA, Makoto, NOZAWA, Syuji, NIINO, Reiji, HASHIMOTO, Hiroyuki, YAMAGUCHI, Tatsuya
Format:	Patent
Sprache:	eng
Schlagworte:	APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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