PLASMA ETCHING METHOD

In the plasma etching method, a sample is placed on a stage in a chamber. A first gas is introduced into the chamber. Electric field is supplied within the chamber to plasma is generated from the first gas. A first RF power of a first frequency, which is for generating a bias voltage in the sample f...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MIYAKE, Masatoshi, NEGISHI, Nobuyuki, KAMIBAYASHI, Masami, KOFUJI, Naoyuki, YOKOGAWA, Ken'etsu
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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