Activation Of Wafer Particle Defects For Spectroscopic Composition Analysis

Methods and systems for detecting a particle defect on a wafer surface, transforming the particle to a spectroscopically active state, and identifying a material composition of the activated particle by a spectroscopic technique are described herein. Particle defects are transformed by chemical trea...

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Bibliographische Detailangaben
1. Verfasser: Haller, Kurt L
Format: Patent
Sprache:eng
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