METHOD OF FORMING PATTERNS, PATTERNS FORMED ACCORDING TO THE METHOD, AND SEMICONDUCTOR DEVICE INCLUDING THE PATTERNS

A method of forming patterns, patterns formed according to the method, and a semiconductor device including the patterns, the method including forming an etching subject layer on a substrate, forming a first layer on the etching subject layer such that the first layer has a projecting pattern, formi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KWAK, TaekSoo, NOH, Kunbae, JANG, Junyoung, SEO, Jinwoo, BAE, Jin-Hee, YUN, Huichan
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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