MAGNETIC MEMORY DEVICES

A device that includes a magnetic memory device, includes a magnetic tunnel junction pattern on a substrate and a mask structure on the magnetic tunnel junction pattern. The mask structure includes a conductive pattern and a sacrificial pattern, where the conductive pattern is between the magnetic t...

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creator JEONG, Daeeun
description A device that includes a magnetic memory device, includes a magnetic tunnel junction pattern on a substrate and a mask structure on the magnetic tunnel junction pattern. The mask structure includes a conductive pattern and a sacrificial pattern, where the conductive pattern is between the magnetic tunnel junction pattern and the sacrificial pattern, and the sacrificial pattern includes a material having an etch selectivity with respect to the conductive pattern. The device includes an upper contact plug in contact with a surface of the conductive pattern of the mask structure. The device includes a lower interlayered insulating layer covering a cell region and a peripheral circuit region of the substrate, where the lower interlayered insulating layer on the cell region has a recessed top surface between adjacent magnetic tunnel junction patterns.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2018197914A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2018197914A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2018197914A13</originalsourceid><addsrcrecordid>eNrjZBD3dXT3cw3xdFbwdfX1D4pUcHEN83R2DeZhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGhhaGluaWhiaOhsbEqQIAUYwgag</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>MAGNETIC MEMORY DEVICES</title><source>esp@cenet</source><creator>JEONG, Daeeun</creator><creatorcontrib>JEONG, Daeeun</creatorcontrib><description>A device that includes a magnetic memory device, includes a magnetic tunnel junction pattern on a substrate and a mask structure on the magnetic tunnel junction pattern. The mask structure includes a conductive pattern and a sacrificial pattern, where the conductive pattern is between the magnetic tunnel junction pattern and the sacrificial pattern, and the sacrificial pattern includes a material having an etch selectivity with respect to the conductive pattern. The device includes an upper contact plug in contact with a surface of the conductive pattern of the mask structure. The device includes a lower interlayered insulating layer covering a cell region and a peripheral circuit region of the substrate, where the lower interlayered insulating layer on the cell region has a recessed top surface between adjacent magnetic tunnel junction patterns.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20180712&amp;DB=EPODOC&amp;CC=US&amp;NR=2018197914A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20180712&amp;DB=EPODOC&amp;CC=US&amp;NR=2018197914A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JEONG, Daeeun</creatorcontrib><title>MAGNETIC MEMORY DEVICES</title><description>A device that includes a magnetic memory device, includes a magnetic tunnel junction pattern on a substrate and a mask structure on the magnetic tunnel junction pattern. The mask structure includes a conductive pattern and a sacrificial pattern, where the conductive pattern is between the magnetic tunnel junction pattern and the sacrificial pattern, and the sacrificial pattern includes a material having an etch selectivity with respect to the conductive pattern. The device includes an upper contact plug in contact with a surface of the conductive pattern of the mask structure. The device includes a lower interlayered insulating layer covering a cell region and a peripheral circuit region of the substrate, where the lower interlayered insulating layer on the cell region has a recessed top surface between adjacent magnetic tunnel junction patterns.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBD3dXT3cw3xdFbwdfX1D4pUcHEN83R2DeZhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGhhaGluaWhiaOhsbEqQIAUYwgag</recordid><startdate>20180712</startdate><enddate>20180712</enddate><creator>JEONG, Daeeun</creator><scope>EVB</scope></search><sort><creationdate>20180712</creationdate><title>MAGNETIC MEMORY DEVICES</title><author>JEONG, Daeeun</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2018197914A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2018</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>JEONG, Daeeun</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>JEONG, Daeeun</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>MAGNETIC MEMORY DEVICES</title><date>2018-07-12</date><risdate>2018</risdate><abstract>A device that includes a magnetic memory device, includes a magnetic tunnel junction pattern on a substrate and a mask structure on the magnetic tunnel junction pattern. The mask structure includes a conductive pattern and a sacrificial pattern, where the conductive pattern is between the magnetic tunnel junction pattern and the sacrificial pattern, and the sacrificial pattern includes a material having an etch selectivity with respect to the conductive pattern. The device includes an upper contact plug in contact with a surface of the conductive pattern of the mask structure. The device includes a lower interlayered insulating layer covering a cell region and a peripheral circuit region of the substrate, where the lower interlayered insulating layer on the cell region has a recessed top surface between adjacent magnetic tunnel junction patterns.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title MAGNETIC MEMORY DEVICES
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-01T17%3A17%3A15IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=JEONG,%20Daeeun&rft.date=2018-07-12&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2018197914A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true