LASER GAS PURIFYING SYSTEM

A laser gas purifying system is configured to purify emission gas emitted from an ArF excimer laser apparatus using laser gas including xenon gas and to supply the purified gas to the ArF excimer laser apparatus. The laser gas purifying system comprises a xenon trap configured to reduce xenon gas co...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: YASHIRO, Masanori, WAKABAYASHI, Osamu, SUZUKI, Natsushi
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator YASHIRO, Masanori
WAKABAYASHI, Osamu
SUZUKI, Natsushi
description A laser gas purifying system is configured to purify emission gas emitted from an ArF excimer laser apparatus using laser gas including xenon gas and to supply the purified gas to the ArF excimer laser apparatus. The laser gas purifying system comprises a xenon trap configured to reduce xenon gas concentration in the emission gas, and a xenon-adding unit configured to add xenon gas to the emission gas passed through the xenon trap.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2018191122A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2018191122A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2018191122A13</originalsourceid><addsrcrecordid>eNrjZJDycQx2DVJwdwxWCAgN8nSL9PRzVwiODA5x9eVhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGhhaGloaGRkaOhsbEqQIAuxchPw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>LASER GAS PURIFYING SYSTEM</title><source>esp@cenet</source><creator>YASHIRO, Masanori ; WAKABAYASHI, Osamu ; SUZUKI, Natsushi</creator><creatorcontrib>YASHIRO, Masanori ; WAKABAYASHI, Osamu ; SUZUKI, Natsushi</creatorcontrib><description>A laser gas purifying system is configured to purify emission gas emitted from an ArF excimer laser apparatus using laser gas including xenon gas and to supply the purified gas to the ArF excimer laser apparatus. The laser gas purifying system comprises a xenon trap configured to reduce xenon gas concentration in the emission gas, and a xenon-adding unit configured to add xenon gas to the emission gas passed through the xenon trap.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSEGASES [GHG] ; DEVICES USING STIMULATED EMISSION ; ELECTRICITY ; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC ; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; SEPARATION ; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS ; TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE ; TRANSPORTING</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20180705&amp;DB=EPODOC&amp;CC=US&amp;NR=2018191122A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20180705&amp;DB=EPODOC&amp;CC=US&amp;NR=2018191122A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YASHIRO, Masanori</creatorcontrib><creatorcontrib>WAKABAYASHI, Osamu</creatorcontrib><creatorcontrib>SUZUKI, Natsushi</creatorcontrib><title>LASER GAS PURIFYING SYSTEM</title><description>A laser gas purifying system is configured to purify emission gas emitted from an ArF excimer laser apparatus using laser gas including xenon gas and to supply the purified gas to the ArF excimer laser apparatus. The laser gas purifying system comprises a xenon trap configured to reduce xenon gas concentration in the emission gas, and a xenon-adding unit configured to add xenon gas to the emission gas passed through the xenon trap.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSEGASES [GHG]</subject><subject>DEVICES USING STIMULATED EMISSION</subject><subject>ELECTRICITY</subject><subject>GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC</subject><subject>GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>SEPARATION</subject><subject>TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS</subject><subject>TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJDycQx2DVJwdwxWCAgN8nSL9PRzVwiODA5x9eVhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGhhaGloaGRkaOhsbEqQIAuxchPw</recordid><startdate>20180705</startdate><enddate>20180705</enddate><creator>YASHIRO, Masanori</creator><creator>WAKABAYASHI, Osamu</creator><creator>SUZUKI, Natsushi</creator><scope>EVB</scope></search><sort><creationdate>20180705</creationdate><title>LASER GAS PURIFYING SYSTEM</title><author>YASHIRO, Masanori ; WAKABAYASHI, Osamu ; SUZUKI, Natsushi</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2018191122A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2018</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSEGASES [GHG]</topic><topic>DEVICES USING STIMULATED EMISSION</topic><topic>ELECTRICITY</topic><topic>GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC</topic><topic>GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>SEPARATION</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS</topic><topic>TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>YASHIRO, Masanori</creatorcontrib><creatorcontrib>WAKABAYASHI, Osamu</creatorcontrib><creatorcontrib>SUZUKI, Natsushi</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YASHIRO, Masanori</au><au>WAKABAYASHI, Osamu</au><au>SUZUKI, Natsushi</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LASER GAS PURIFYING SYSTEM</title><date>2018-07-05</date><risdate>2018</risdate><abstract>A laser gas purifying system is configured to purify emission gas emitted from an ArF excimer laser apparatus using laser gas including xenon gas and to supply the purified gas to the ArF excimer laser apparatus. The laser gas purifying system comprises a xenon trap configured to reduce xenon gas concentration in the emission gas, and a xenon-adding unit configured to add xenon gas to the emission gas passed through the xenon trap.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_US2018191122A1
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSEGASES [GHG]
DEVICES USING STIMULATED EMISSION
ELECTRICITY
GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEPARATION
TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE
TRANSPORTING
title LASER GAS PURIFYING SYSTEM
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-24T22%3A35%3A36IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=YASHIRO,%20Masanori&rft.date=2018-07-05&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2018191122A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true