METHOD FOR CONTROLLING VAPOR PHASE GROWTH APPARATUS

According to an aspect of the invention, there is provided a method for controlling a vapor phase growth apparatus, the vapor phase growth apparatus including a first reactor and a second reactor, a first substrate being processed in the first reactor, a second substrate being processed in the secon...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SATO, Yuusuke, TAKAHASHI, Hideshi
Format: Patent
Sprache:eng
Schlagworte:
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