DUMMY CONTACTS TO MITIGATE PLASMA CHARGING DAMAGE TO GATE DIELECTRICS

A method of limiting plasma charging damage on ICs. A die includes gate stacks on active areas defined by a field dielectric. A pre-metal dielectric (PMD) layer is over the gate electrode. A contact masking material pattern is defined on the PMD layer including first contact defining features for fo...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	RULLAN, ERIC D, KIM, TAE S, NANDAKUMAR, MAHALINGAM, VISOKAY, MARK ROBERT, SHINN, GREGORY B
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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