METHOD OF FORMING PATTERNS FOR SEMICONDUCTOR DEVICE

A method of forming patterns for a semiconductor device includes preparing a hardmask composition including a carbon allotrope, a spin-on hardmask (SOH) material, an aromatic ring-containing polymer, and a solvent, applying the hardmask composition to an etching target layer, forming a hardmask by h...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Kim, Ye-hwan, KANG, Yool, Choi, Yun-seok, Park, Kyoung-sil, Kim, Boo-deuk
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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