WATERMARK EMBEDDING APPARATUS AND METHOD, AND WATERMARK DETECTING APPARATUS AND METHOD FOR 3D PRINTING ENVIRONMENT
In a watermark embedding method and apparatus, a layered three-dimensional model is aligned in a printing direction based on a layering direction of the layered three-dimensional model. Then, a watermark having a predetermined pattern is embedded into the aligned three-dimensional model in a directi...
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creator | JANG, Han-Ul KIM, Do-Gon LEE, Heung-Kyu CHOI, Hak-Yeol HOU, Jong-Uk SONG, Hyun-Ji |
description | In a watermark embedding method and apparatus, a layered three-dimensional model is aligned in a printing direction based on a layering direction of the layered three-dimensional model. Then, a watermark having a predetermined pattern is embedded into the aligned three-dimensional model in a direction orthogonal to the printing direction so that the embedded watermark is not associated with the printing direction. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2018114289A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2018114289A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2018114289A13</originalsourceid><addsrcrecordid>eNrjZCgKdwxxDfJ1DPJWcPV1cnVx8fRzV3AMCHAMcgwJDVZw9HNR8HUN8fB30QGzEapdXENcnUNwqVZw8w9SMHZRCAjy9AMrcvUL8wzy9_N19QvhYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXxocFGBoYWhoYmRhaWjobGxKkCAAuyOS4</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>WATERMARK EMBEDDING APPARATUS AND METHOD, AND WATERMARK DETECTING APPARATUS AND METHOD FOR 3D PRINTING ENVIRONMENT</title><source>esp@cenet</source><creator>JANG, Han-Ul ; KIM, Do-Gon ; LEE, Heung-Kyu ; CHOI, Hak-Yeol ; HOU, Jong-Uk ; SONG, Hyun-Ji</creator><creatorcontrib>JANG, Han-Ul ; KIM, Do-Gon ; LEE, Heung-Kyu ; CHOI, Hak-Yeol ; HOU, Jong-Uk ; SONG, Hyun-Ji</creatorcontrib><description>In a watermark embedding method and apparatus, a layered three-dimensional model is aligned in a printing direction based on a layering direction of the layered three-dimensional model. Then, a watermark having a predetermined pattern is embedded into the aligned three-dimensional model in a direction orthogonal to the printing direction so that the embedded watermark is not associated with the printing direction.</description><language>eng</language><subject>CALCULATING ; COMPUTING ; COUNTING ; ELECTRIC DIGITAL DATA PROCESSING ; IMAGE DATA PROCESSING OR GENERATION, IN GENERAL ; PHYSICS</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180426&DB=EPODOC&CC=US&NR=2018114289A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180426&DB=EPODOC&CC=US&NR=2018114289A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JANG, Han-Ul</creatorcontrib><creatorcontrib>KIM, Do-Gon</creatorcontrib><creatorcontrib>LEE, Heung-Kyu</creatorcontrib><creatorcontrib>CHOI, Hak-Yeol</creatorcontrib><creatorcontrib>HOU, Jong-Uk</creatorcontrib><creatorcontrib>SONG, Hyun-Ji</creatorcontrib><title>WATERMARK EMBEDDING APPARATUS AND METHOD, AND WATERMARK DETECTING APPARATUS AND METHOD FOR 3D PRINTING ENVIRONMENT</title><description>In a watermark embedding method and apparatus, a layered three-dimensional model is aligned in a printing direction based on a layering direction of the layered three-dimensional model. Then, a watermark having a predetermined pattern is embedded into the aligned three-dimensional model in a direction orthogonal to the printing direction so that the embedded watermark is not associated with the printing direction.</description><subject>CALCULATING</subject><subject>COMPUTING</subject><subject>COUNTING</subject><subject>ELECTRIC DIGITAL DATA PROCESSING</subject><subject>IMAGE DATA PROCESSING OR GENERATION, IN GENERAL</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZCgKdwxxDfJ1DPJWcPV1cnVx8fRzV3AMCHAMcgwJDVZw9HNR8HUN8fB30QGzEapdXENcnUNwqVZw8w9SMHZRCAjy9AMrcvUL8wzy9_N19QvhYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXxocFGBoYWhoYmRhaWjobGxKkCAAuyOS4</recordid><startdate>20180426</startdate><enddate>20180426</enddate><creator>JANG, Han-Ul</creator><creator>KIM, Do-Gon</creator><creator>LEE, Heung-Kyu</creator><creator>CHOI, Hak-Yeol</creator><creator>HOU, Jong-Uk</creator><creator>SONG, Hyun-Ji</creator><scope>EVB</scope></search><sort><creationdate>20180426</creationdate><title>WATERMARK EMBEDDING APPARATUS AND METHOD, AND WATERMARK DETECTING APPARATUS AND METHOD FOR 3D PRINTING ENVIRONMENT</title><author>JANG, Han-Ul ; KIM, Do-Gon ; LEE, Heung-Kyu ; CHOI, Hak-Yeol ; HOU, Jong-Uk ; SONG, Hyun-Ji</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2018114289A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2018</creationdate><topic>CALCULATING</topic><topic>COMPUTING</topic><topic>COUNTING</topic><topic>ELECTRIC DIGITAL DATA PROCESSING</topic><topic>IMAGE DATA PROCESSING OR GENERATION, IN GENERAL</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>JANG, Han-Ul</creatorcontrib><creatorcontrib>KIM, Do-Gon</creatorcontrib><creatorcontrib>LEE, Heung-Kyu</creatorcontrib><creatorcontrib>CHOI, Hak-Yeol</creatorcontrib><creatorcontrib>HOU, Jong-Uk</creatorcontrib><creatorcontrib>SONG, Hyun-Ji</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>JANG, Han-Ul</au><au>KIM, Do-Gon</au><au>LEE, Heung-Kyu</au><au>CHOI, Hak-Yeol</au><au>HOU, Jong-Uk</au><au>SONG, Hyun-Ji</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>WATERMARK EMBEDDING APPARATUS AND METHOD, AND WATERMARK DETECTING APPARATUS AND METHOD FOR 3D PRINTING ENVIRONMENT</title><date>2018-04-26</date><risdate>2018</risdate><abstract>In a watermark embedding method and apparatus, a layered three-dimensional model is aligned in a printing direction based on a layering direction of the layered three-dimensional model. Then, a watermark having a predetermined pattern is embedded into the aligned three-dimensional model in a direction orthogonal to the printing direction so that the embedded watermark is not associated with the printing direction.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | CALCULATING COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING IMAGE DATA PROCESSING OR GENERATION, IN GENERAL PHYSICS |
title | WATERMARK EMBEDDING APPARATUS AND METHOD, AND WATERMARK DETECTING APPARATUS AND METHOD FOR 3D PRINTING ENVIRONMENT |
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