Lithographic Method and Apparatus

A method comprising illuminating a patterning device (MA′) comprising a plurality of patterned regions (15a-15c) of which each patterns a measurement beam (17a-17c), projecting, with a projection system (PL), the measurement beams onto a sensor apparatus (21) comprising a plurality of detector regio...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	VANROOSE Nico, KAUR Chanpreet, BASELMANS Johannes Jacobus Matheus, IMPONENTE Giovanni, STAS Roland Johannes Wilhelmus, DOWNES James Robert, DE BUCK Pieter Bart Aloïs
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
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