METHOD FOR CLEANING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS

According to one embodiment, a method for cleaning a substrate includes first cleaning process and second cleaning process. The first cleaning process subjects a substrate to a first cleaning method. The second cleaning process subjects the substrate to a second cleaning method that is different fro...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	OTSUBO Kyo, SAKURAI Hideaki, INUKAI Minako
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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