High-Purity Dispense System

Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Hooge Joshua S, deVilliers Anton J, Nasman Ronald, Robison Rodney L, Huli Lior, Travis David, Jacobson, JR. Norman A, Grootegoed James
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator Hooge Joshua S
deVilliers Anton J
Nasman Ronald
Robison Rodney L
Huli Lior
Travis David
Jacobson, JR. Norman A
Grootegoed James
description Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A process fluid filter is located downstream from a process fluid source as well as a system valve. Downstream from the process fluid filter there are no valves. Dispense actions can be initiated and stop while the system valve is open by using the elongate bladder. The elongate bladder can be expanded to stop or pause a dispense action, and then be contracted to assist with a dispense action.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2018047562A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2018047562A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2018047562A13</originalsourceid><addsrcrecordid>eNrjZJD2yEzP0A0oLcosqVRwySwuSM0rTlUIriwuSc3lYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXxocFGBoYWBibmpmZGjobGxKkCAPLAJDY</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>High-Purity Dispense System</title><source>esp@cenet</source><creator>Hooge Joshua S ; deVilliers Anton J ; Nasman Ronald ; Robison Rodney L ; Huli Lior ; Travis David ; Jacobson, JR. Norman A ; Grootegoed James</creator><creatorcontrib>Hooge Joshua S ; deVilliers Anton J ; Nasman Ronald ; Robison Rodney L ; Huli Lior ; Travis David ; Jacobson, JR. Norman A ; Grootegoed James</creatorcontrib><description>Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A process fluid filter is located downstream from a process fluid source as well as a system valve. Downstream from the process fluid filter there are no valves. Dispense actions can be initiated and stop while the system valve is open by using the elongate bladder. The elongate bladder can be expanded to stop or pause a dispense action, and then be contracted to assist with a dispense action.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20180215&amp;DB=EPODOC&amp;CC=US&amp;NR=2018047562A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20180215&amp;DB=EPODOC&amp;CC=US&amp;NR=2018047562A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Hooge Joshua S</creatorcontrib><creatorcontrib>deVilliers Anton J</creatorcontrib><creatorcontrib>Nasman Ronald</creatorcontrib><creatorcontrib>Robison Rodney L</creatorcontrib><creatorcontrib>Huli Lior</creatorcontrib><creatorcontrib>Travis David</creatorcontrib><creatorcontrib>Jacobson, JR. Norman A</creatorcontrib><creatorcontrib>Grootegoed James</creatorcontrib><title>High-Purity Dispense System</title><description>Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A process fluid filter is located downstream from a process fluid source as well as a system valve. Downstream from the process fluid filter there are no valves. Dispense actions can be initiated and stop while the system valve is open by using the elongate bladder. The elongate bladder can be expanded to stop or pause a dispense action, and then be contracted to assist with a dispense action.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJD2yEzP0A0oLcosqVRwySwuSM0rTlUIriwuSc3lYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXxocFGBoYWBibmpmZGjobGxKkCAPLAJDY</recordid><startdate>20180215</startdate><enddate>20180215</enddate><creator>Hooge Joshua S</creator><creator>deVilliers Anton J</creator><creator>Nasman Ronald</creator><creator>Robison Rodney L</creator><creator>Huli Lior</creator><creator>Travis David</creator><creator>Jacobson, JR. Norman A</creator><creator>Grootegoed James</creator><scope>EVB</scope></search><sort><creationdate>20180215</creationdate><title>High-Purity Dispense System</title><author>Hooge Joshua S ; deVilliers Anton J ; Nasman Ronald ; Robison Rodney L ; Huli Lior ; Travis David ; Jacobson, JR. Norman A ; Grootegoed James</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2018047562A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2018</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>Hooge Joshua S</creatorcontrib><creatorcontrib>deVilliers Anton J</creatorcontrib><creatorcontrib>Nasman Ronald</creatorcontrib><creatorcontrib>Robison Rodney L</creatorcontrib><creatorcontrib>Huli Lior</creatorcontrib><creatorcontrib>Travis David</creatorcontrib><creatorcontrib>Jacobson, JR. Norman A</creatorcontrib><creatorcontrib>Grootegoed James</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Hooge Joshua S</au><au>deVilliers Anton J</au><au>Nasman Ronald</au><au>Robison Rodney L</au><au>Huli Lior</au><au>Travis David</au><au>Jacobson, JR. Norman A</au><au>Grootegoed James</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>High-Purity Dispense System</title><date>2018-02-15</date><risdate>2018</risdate><abstract>Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A process fluid filter is located downstream from a process fluid source as well as a system valve. Downstream from the process fluid filter there are no valves. Dispense actions can be initiated and stop while the system valve is open by using the elongate bladder. The elongate bladder can be expanded to stop or pause a dispense action, and then be contracted to assist with a dispense action.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_US2018047562A1
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title High-Purity Dispense System
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-12T12%3A52%3A07IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Hooge%20Joshua%20S&rft.date=2018-02-15&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2018047562A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true