PROJECTION SYSTEM
A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a s...
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| creator | MERKX Leon Leonardus Franciscus KNOPS Raoul Maarten Simon STREEFKERK Bob BUTLER Hans VALENTIN Christiaan Louis MERRY Roel Johannes Elisabeth VAN SCHOOT Jan Bernard Plechelmus SIMONS Wilhelmus Franciscus Johanne YPMA Michael Frederik DE JONGH Robertus Johannes Marinus |
| description | A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements. |
| format | Patent |
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The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20171221&DB=EPODOC&CC=US&NR=2017363965A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20171221&DB=EPODOC&CC=US&NR=2017363965A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MERKX Leon Leonardus Franciscus</creatorcontrib><creatorcontrib>KNOPS Raoul Maarten Simon</creatorcontrib><creatorcontrib>STREEFKERK Bob</creatorcontrib><creatorcontrib>BUTLER Hans</creatorcontrib><creatorcontrib>VALENTIN Christiaan Louis</creatorcontrib><creatorcontrib>MERRY Roel Johannes Elisabeth</creatorcontrib><creatorcontrib>VAN SCHOOT Jan Bernard Plechelmus</creatorcontrib><creatorcontrib>SIMONS Wilhelmus Franciscus Johanne</creatorcontrib><creatorcontrib>YPMA Michael Frederik</creatorcontrib><creatorcontrib>DE JONGH Robertus Johannes Marinus</creatorcontrib><title>PROJECTION SYSTEM</title><description>A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBAMCPL3cnUO8fT3UwiODA5x9eVhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGhubGZsaWZqaOhsbEqQIAr48fAg</recordid><startdate>20171221</startdate><enddate>20171221</enddate><creator>MERKX Leon Leonardus Franciscus</creator><creator>KNOPS Raoul Maarten Simon</creator><creator>STREEFKERK Bob</creator><creator>BUTLER Hans</creator><creator>VALENTIN Christiaan Louis</creator><creator>MERRY Roel Johannes Elisabeth</creator><creator>VAN SCHOOT Jan Bernard Plechelmus</creator><creator>SIMONS Wilhelmus Franciscus Johanne</creator><creator>YPMA Michael Frederik</creator><creator>DE JONGH Robertus Johannes Marinus</creator><scope>EVB</scope></search><sort><creationdate>20171221</creationdate><title>PROJECTION SYSTEM</title><author>MERKX Leon Leonardus Franciscus ; KNOPS Raoul Maarten Simon ; STREEFKERK Bob ; BUTLER Hans ; VALENTIN Christiaan Louis ; MERRY Roel Johannes Elisabeth ; VAN SCHOOT Jan Bernard Plechelmus ; SIMONS Wilhelmus Franciscus Johanne ; YPMA Michael Frederik ; DE JONGH Robertus Johannes Marinus</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2017363965A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2017</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>MERKX Leon Leonardus Franciscus</creatorcontrib><creatorcontrib>KNOPS Raoul Maarten Simon</creatorcontrib><creatorcontrib>STREEFKERK Bob</creatorcontrib><creatorcontrib>BUTLER Hans</creatorcontrib><creatorcontrib>VALENTIN Christiaan Louis</creatorcontrib><creatorcontrib>MERRY Roel Johannes Elisabeth</creatorcontrib><creatorcontrib>VAN SCHOOT Jan Bernard Plechelmus</creatorcontrib><creatorcontrib>SIMONS Wilhelmus Franciscus Johanne</creatorcontrib><creatorcontrib>YPMA Michael Frederik</creatorcontrib><creatorcontrib>DE JONGH Robertus Johannes Marinus</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MERKX Leon Leonardus Franciscus</au><au>KNOPS Raoul Maarten Simon</au><au>STREEFKERK Bob</au><au>BUTLER Hans</au><au>VALENTIN Christiaan Louis</au><au>MERRY Roel Johannes Elisabeth</au><au>VAN SCHOOT Jan Bernard Plechelmus</au><au>SIMONS Wilhelmus Franciscus Johanne</au><au>YPMA Michael Frederik</au><au>DE JONGH Robertus Johannes Marinus</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PROJECTION SYSTEM</title><date>2017-12-21</date><risdate>2017</risdate><abstract>A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | PROJECTION SYSTEM |
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