A FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD

A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially o...

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Hauptverfasser: GATTOBIGIO Giovanni Luca, EUMMELEN Erik Henricus Egidius Catharina, VAN DER HAM Ronald, STALS Walter Theodorus Matheus, VAN DER ZANDEN Frederik Antonius, BESSEMS David, WERNAART Wilhelmus Antonius, ROPS Cornelius Maria, BLANCO CARBALLO Victor Manuel
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creator GATTOBIGIO Giovanni Luca
EUMMELEN Erik Henricus Egidius Catharina
VAN DER HAM Ronald
STALS Walter Theodorus Matheus
VAN DER ZANDEN Frederik Antonius
BESSEMS David
WERNAART Wilhelmus Antonius
ROPS Cornelius Maria
BLANCO CARBALLO Victor Manuel
description A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.
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subjects ACCESSORIES THEREFOR
APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title A FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
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