FIELD EFFECT TRANSISTOR AND METHOD OF FABRICATING THE SAME

The present disclosure relates to a field-effect transistor and a method of fabricating the same. A field-effect transistor includes a semiconductor substrate including a first semiconductor material having a first lattice constant, and a fin structure on the semiconductor substrate. The fin structu...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Heo Yeoncheol, Cantoro Mirco
Format: Patent
Sprache:eng
Schlagworte:
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