Buried Channel Deeply Depleted Channel Transistor

Semiconductor devices and methods of fabricating such devices are provided. The devices include source and drain regions on one conductivity type separated by a channel length and a gate structure. The devices also include a channel region of the one conductivity type formed in the device region bet...

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Bibliographische Detailangaben
Hauptverfasser: Wang Lingquan, Zhao Dalong, Bakhishev Teymur, Ranade Pushkar, Thompson Scott E
Format: Patent
Sprache:eng
Schlagworte:
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