Processing Apparatus
A processing apparatus includes a central control unit, and a processing quality prediction unit, a processing unit, and a tool compensation unit which are respectively connected with the central control unit electrically. The processing quality prediction unit implements a virtual processing qualit...
Gespeichert in:
| Hauptverfasser: | , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | Yang Haw Ching Tieng Hao Hou Hsin Hong SU PO CHENG Cheng Fan Tien |
| description | A processing apparatus includes a central control unit, and a processing quality prediction unit, a processing unit, and a tool compensation unit which are respectively connected with the central control unit electrically. The processing quality prediction unit implements a virtual processing quality prediction method to predict the processing quality of the workpiece, output an accurate data of quality to the central control unit, and generate tool path for the processing unit to process the workpiece. The central control unit judges the data from the processing quality prediction unit and outputs the data to the tool compensation unit to calculate tool compensation data. The tool compensation unit provides the tool compensation data to the processing quality prediction unit to form a new processing path. Then the processing unit implements the compensated processing path to process the workpiece. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2017322547A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2017322547A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2017322547A13</originalsourceid><addsrcrecordid>eNrjZBAJKMpPTi0uzsxLV3AsKEgsSiwpLeZhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGhubGRkamJuaOhsbEqQIA4Ush3w</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Processing Apparatus</title><source>esp@cenet</source><creator>Yang Haw Ching ; Tieng Hao ; Hou Hsin Hong ; SU PO CHENG ; Cheng Fan Tien</creator><creatorcontrib>Yang Haw Ching ; Tieng Hao ; Hou Hsin Hong ; SU PO CHENG ; Cheng Fan Tien</creatorcontrib><description>A processing apparatus includes a central control unit, and a processing quality prediction unit, a processing unit, and a tool compensation unit which are respectively connected with the central control unit electrically. The processing quality prediction unit implements a virtual processing quality prediction method to predict the processing quality of the workpiece, output an accurate data of quality to the central control unit, and generate tool path for the processing unit to process the workpiece. The central control unit judges the data from the processing quality prediction unit and outputs the data to the tool compensation unit to calculate tool compensation data. The tool compensation unit provides the tool compensation data to the processing quality prediction unit to form a new processing path. Then the processing unit implements the compensated processing path to process the workpiece.</description><language>eng</language><subject>CONTROL OR REGULATING SYSTEMS IN GENERAL ; CONTROLLING ; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS ; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ; PHYSICS ; REGULATING</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20171109&DB=EPODOC&CC=US&NR=2017322547A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20171109&DB=EPODOC&CC=US&NR=2017322547A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Yang Haw Ching</creatorcontrib><creatorcontrib>Tieng Hao</creatorcontrib><creatorcontrib>Hou Hsin Hong</creatorcontrib><creatorcontrib>SU PO CHENG</creatorcontrib><creatorcontrib>Cheng Fan Tien</creatorcontrib><title>Processing Apparatus</title><description>A processing apparatus includes a central control unit, and a processing quality prediction unit, a processing unit, and a tool compensation unit which are respectively connected with the central control unit electrically. The processing quality prediction unit implements a virtual processing quality prediction method to predict the processing quality of the workpiece, output an accurate data of quality to the central control unit, and generate tool path for the processing unit to process the workpiece. The central control unit judges the data from the processing quality prediction unit and outputs the data to the tool compensation unit to calculate tool compensation data. The tool compensation unit provides the tool compensation data to the processing quality prediction unit to form a new processing path. Then the processing unit implements the compensated processing path to process the workpiece.</description><subject>CONTROL OR REGULATING SYSTEMS IN GENERAL</subject><subject>CONTROLLING</subject><subject>FUNCTIONAL ELEMENTS OF SUCH SYSTEMS</subject><subject>MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS</subject><subject>PHYSICS</subject><subject>REGULATING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBAJKMpPTi0uzsxLV3AsKEgsSiwpLeZhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGhubGRkamJuaOhsbEqQIA4Ush3w</recordid><startdate>20171109</startdate><enddate>20171109</enddate><creator>Yang Haw Ching</creator><creator>Tieng Hao</creator><creator>Hou Hsin Hong</creator><creator>SU PO CHENG</creator><creator>Cheng Fan Tien</creator><scope>EVB</scope></search><sort><creationdate>20171109</creationdate><title>Processing Apparatus</title><author>Yang Haw Ching ; Tieng Hao ; Hou Hsin Hong ; SU PO CHENG ; Cheng Fan Tien</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2017322547A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2017</creationdate><topic>CONTROL OR REGULATING SYSTEMS IN GENERAL</topic><topic>CONTROLLING</topic><topic>FUNCTIONAL ELEMENTS OF SUCH SYSTEMS</topic><topic>MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS</topic><topic>PHYSICS</topic><topic>REGULATING</topic><toplevel>online_resources</toplevel><creatorcontrib>Yang Haw Ching</creatorcontrib><creatorcontrib>Tieng Hao</creatorcontrib><creatorcontrib>Hou Hsin Hong</creatorcontrib><creatorcontrib>SU PO CHENG</creatorcontrib><creatorcontrib>Cheng Fan Tien</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Yang Haw Ching</au><au>Tieng Hao</au><au>Hou Hsin Hong</au><au>SU PO CHENG</au><au>Cheng Fan Tien</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Processing Apparatus</title><date>2017-11-09</date><risdate>2017</risdate><abstract>A processing apparatus includes a central control unit, and a processing quality prediction unit, a processing unit, and a tool compensation unit which are respectively connected with the central control unit electrically. The processing quality prediction unit implements a virtual processing quality prediction method to predict the processing quality of the workpiece, output an accurate data of quality to the central control unit, and generate tool path for the processing unit to process the workpiece. The central control unit judges the data from the processing quality prediction unit and outputs the data to the tool compensation unit to calculate tool compensation data. The tool compensation unit provides the tool compensation data to the processing quality prediction unit to form a new processing path. Then the processing unit implements the compensated processing path to process the workpiece.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US2017322547A1 |
| source | esp@cenet |
| subjects | CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING FUNCTIONAL ELEMENTS OF SUCH SYSTEMS MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS PHYSICS REGULATING |
| title | Processing Apparatus |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-28T15%3A22%3A43IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Yang%20Haw%20Ching&rft.date=2017-11-09&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2017322547A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |