PVD APPARATUS AND METHOD WITH DEPOSITION CHAMBER HAVING MULTIPLE TARGETS AND MAGNETS
A thin film deposition system and method provide for multiple target assemblies that may be separately powered. Each target assembly includes a target and associated magnet or set of magnets. The disclosure provides a tunable film profile produced by multiple power sources that separately power the...
Gespeichert in:
| Hauptverfasser: | , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | Tsai Ming-Chin Lee Chih-Tsung Kao Chung-En Chiang Chen-Chia Chou You-Hua Kuo Ming-Shiou |
| description | A thin film deposition system and method provide for multiple target assemblies that may be separately powered. Each target assembly includes a target and associated magnet or set of magnets. The disclosure provides a tunable film profile produced by multiple power sources that separately power the target arrangements. The relative amounts of power supplied to the target arrangements may be customized to provide a desired film and may be varied in time to produce a film with varied characteristics. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2017314121A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2017314121A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2017314121A13</originalsourceid><addsrcrecordid>eNqNi7sKwjAUQLM4iPoPF5wF0wrO1-aaBJoH6U0dS5E4iRbq_6NDP8DpnOGcteDYK8AYMSHnDtArcMQmKLhZNqAohs6yDR4ag-5CCQz21mtwuWUbWwLGpImXFbX_-VasHuNzLruFG7G_EjfmUKb3UOZpvJdX-Qy5q47yXMuTrCTK-r_qC-toMPs</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PVD APPARATUS AND METHOD WITH DEPOSITION CHAMBER HAVING MULTIPLE TARGETS AND MAGNETS</title><source>esp@cenet</source><creator>Tsai Ming-Chin ; Lee Chih-Tsung ; Kao Chung-En ; Chiang Chen-Chia ; Chou You-Hua ; Kuo Ming-Shiou</creator><creatorcontrib>Tsai Ming-Chin ; Lee Chih-Tsung ; Kao Chung-En ; Chiang Chen-Chia ; Chou You-Hua ; Kuo Ming-Shiou</creatorcontrib><description>A thin film deposition system and method provide for multiple target assemblies that may be separately powered. Each target assembly includes a target and associated magnet or set of magnets. The disclosure provides a tunable film profile produced by multiple power sources that separately power the target arrangements. The relative amounts of power supplied to the target arrangements may be customized to provide a desired film and may be varied in time to produce a film with varied characteristics.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20171102&DB=EPODOC&CC=US&NR=2017314121A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20171102&DB=EPODOC&CC=US&NR=2017314121A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Tsai Ming-Chin</creatorcontrib><creatorcontrib>Lee Chih-Tsung</creatorcontrib><creatorcontrib>Kao Chung-En</creatorcontrib><creatorcontrib>Chiang Chen-Chia</creatorcontrib><creatorcontrib>Chou You-Hua</creatorcontrib><creatorcontrib>Kuo Ming-Shiou</creatorcontrib><title>PVD APPARATUS AND METHOD WITH DEPOSITION CHAMBER HAVING MULTIPLE TARGETS AND MAGNETS</title><description>A thin film deposition system and method provide for multiple target assemblies that may be separately powered. Each target assembly includes a target and associated magnet or set of magnets. The disclosure provides a tunable film profile produced by multiple power sources that separately power the target arrangements. The relative amounts of power supplied to the target arrangements may be customized to provide a desired film and may be varied in time to produce a film with varied characteristics.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNi7sKwjAUQLM4iPoPF5wF0wrO1-aaBJoH6U0dS5E4iRbq_6NDP8DpnOGcteDYK8AYMSHnDtArcMQmKLhZNqAohs6yDR4ag-5CCQz21mtwuWUbWwLGpImXFbX_-VasHuNzLruFG7G_EjfmUKb3UOZpvJdX-Qy5q47yXMuTrCTK-r_qC-toMPs</recordid><startdate>20171102</startdate><enddate>20171102</enddate><creator>Tsai Ming-Chin</creator><creator>Lee Chih-Tsung</creator><creator>Kao Chung-En</creator><creator>Chiang Chen-Chia</creator><creator>Chou You-Hua</creator><creator>Kuo Ming-Shiou</creator><scope>EVB</scope></search><sort><creationdate>20171102</creationdate><title>PVD APPARATUS AND METHOD WITH DEPOSITION CHAMBER HAVING MULTIPLE TARGETS AND MAGNETS</title><author>Tsai Ming-Chin ; Lee Chih-Tsung ; Kao Chung-En ; Chiang Chen-Chia ; Chou You-Hua ; Kuo Ming-Shiou</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2017314121A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2017</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>Tsai Ming-Chin</creatorcontrib><creatorcontrib>Lee Chih-Tsung</creatorcontrib><creatorcontrib>Kao Chung-En</creatorcontrib><creatorcontrib>Chiang Chen-Chia</creatorcontrib><creatorcontrib>Chou You-Hua</creatorcontrib><creatorcontrib>Kuo Ming-Shiou</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Tsai Ming-Chin</au><au>Lee Chih-Tsung</au><au>Kao Chung-En</au><au>Chiang Chen-Chia</au><au>Chou You-Hua</au><au>Kuo Ming-Shiou</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PVD APPARATUS AND METHOD WITH DEPOSITION CHAMBER HAVING MULTIPLE TARGETS AND MAGNETS</title><date>2017-11-02</date><risdate>2017</risdate><abstract>A thin film deposition system and method provide for multiple target assemblies that may be separately powered. Each target assembly includes a target and associated magnet or set of magnets. The disclosure provides a tunable film profile produced by multiple power sources that separately power the target arrangements. The relative amounts of power supplied to the target arrangements may be customized to provide a desired film and may be varied in time to produce a film with varied characteristics.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US2017314121A1 |
| source | esp@cenet |
| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | PVD APPARATUS AND METHOD WITH DEPOSITION CHAMBER HAVING MULTIPLE TARGETS AND MAGNETS |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-16T11%3A59%3A44IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Tsai%20Ming-Chin&rft.date=2017-11-02&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2017314121A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |