CHUCK FOR EDGE BEVEL REMOVAL AND METHOD FOR CENTERING A WAFER PRIOR TO EDGE BEVEL REMOVAL

A chuck useful for supporting a wafer during an edge bevel removal (EBR) process comprises a rotatable center hub having a plurality of support arms extending outwardly from the rotatable center hub, support pins on ends of the support arms, gas passages extending through upper surfaces of the suppo...

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Hauptverfasser:	LaBrie Aaron Louis, Braendle Robert Lynden, Sweeney Cian Owen
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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creator	LaBrie Aaron Louis Braendle Robert Lynden Sweeney Cian Owen
description	A chuck useful for supporting a wafer during an edge bevel removal (EBR) process comprises a rotatable center hub having a plurality of support arms extending outwardly from the rotatable center hub, support pins on ends of the support arms, gas passages extending through upper surfaces of the support pins, and gas conduits in the support arms, the gas conduits configured to supply gas to the gas passages or apply a vacuum to the gas passages. The support arms can include alignment cams which are rotatable from an outer non-alignment position away from a periphery of the wafer to an inner alignment position at which the wafer is centered. To supply gas or apply a vacuum force to the gas outlets in the support pins, the rotatable center hub can have a gas inlet and a plurality of gas delivery ports in fluid communication with the gas delivery conduits in the support arms. Gas can be supplied to the gas outlets by a source of pressurized gas connected to the gas inlet and suction can be applied to the gas outlets by a vacuum source connected to the gas inlet. During centering, the wafer is floated on a gas cushion which reduces wear of the support pins.
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The support arms can include alignment cams which are rotatable from an outer non-alignment position away from a periphery of the wafer to an inner alignment position at which the wafer is centered. To supply gas or apply a vacuum force to the gas outlets in the support pins, the rotatable center hub can have a gas inlet and a plurality of gas delivery ports in fluid communication with the gas delivery conduits in the support arms. Gas can be supplied to the gas outlets by a source of pressurized gas connected to the gas inlet and suction can be applied to the gas outlets by a vacuum source connected to the gas inlet. 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language	eng
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subjects	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
title	CHUCK FOR EDGE BEVEL REMOVAL AND METHOD FOR CENTERING A WAFER PRIOR TO EDGE BEVEL REMOVAL
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