ALD Coating System and Method for Operating an ALD Coating System
A method for operating an ALD coating system is disclosed. In an embodiment the method includes lowering a temperature of an intermediate container by a device for cooling the intermediate container so that a temperature of the intermediate container is below a temperature of a storage container, fl...
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creator | Baisl Richard Popp Michael |
description | A method for operating an ALD coating system is disclosed. In an embodiment the method includes lowering a temperature of an intermediate container by a device for cooling the intermediate container so that a temperature of the intermediate container is below a temperature of a storage container, flowing a partial amount of the organometallic starting material into the intermediate container, heating the partial amount of the organometallic starting material by a device for heating the organometallic starting material so that a pressure of the partial amount of the organometallic starting material is constant over time and/or is greater than a pressure of the organometallic starting material in the storage container and opening a second multiway valve so that the partial amount of the organometallic starting material partially flows as a gas into a process chamber. |
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In an embodiment the method includes lowering a temperature of an intermediate container by a device for cooling the intermediate container so that a temperature of the intermediate container is below a temperature of a storage container, flowing a partial amount of the organometallic starting material into the intermediate container, heating the partial amount of the organometallic starting material by a device for heating the organometallic starting material so that a pressure of the partial amount of the organometallic starting material is constant over time and/or is greater than a pressure of the organometallic starting material in the storage container and opening a second multiway valve so that the partial amount of the organometallic starting material partially flows as a gas into a process chamber.</description><language>eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170907&DB=EPODOC&CC=US&NR=2017253970A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170907&DB=EPODOC&CC=US&NR=2017253970A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Baisl Richard</creatorcontrib><creatorcontrib>Popp Michael</creatorcontrib><title>ALD Coating System and Method for Operating an ALD Coating System</title><description>A method for operating an ALD coating system is disclosed. In an embodiment the method includes lowering a temperature of an intermediate container by a device for cooling the intermediate container so that a temperature of the intermediate container is below a temperature of a storage container, flowing a partial amount of the organometallic starting material into the intermediate container, heating the partial amount of the organometallic starting material by a device for heating the organometallic starting material so that a pressure of the partial amount of the organometallic starting material is constant over time and/or is greater than a pressure of the organometallic starting material in the storage container and opening a second multiway valve so that the partial amount of the organometallic starting material partially flows as a gas into a process chamber.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHB09HFRcM5PLMnMS1cIriwuSc1VSMxLUfBNLcnIT1FIyy9S8C9ILYLIJ-YpYCrnYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXxocFGBobmRqbGluYGjobGxKkCAOxHMO0</recordid><startdate>20170907</startdate><enddate>20170907</enddate><creator>Baisl Richard</creator><creator>Popp Michael</creator><scope>EVB</scope></search><sort><creationdate>20170907</creationdate><title>ALD Coating System and Method for Operating an ALD Coating System</title><author>Baisl Richard ; Popp Michael</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2017253970A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2017</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>Baisl Richard</creatorcontrib><creatorcontrib>Popp Michael</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Baisl Richard</au><au>Popp Michael</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ALD Coating System and Method for Operating an ALD Coating System</title><date>2017-09-07</date><risdate>2017</risdate><abstract>A method for operating an ALD coating system is disclosed. In an embodiment the method includes lowering a temperature of an intermediate container by a device for cooling the intermediate container so that a temperature of the intermediate container is below a temperature of a storage container, flowing a partial amount of the organometallic starting material into the intermediate container, heating the partial amount of the organometallic starting material by a device for heating the organometallic starting material so that a pressure of the partial amount of the organometallic starting material is constant over time and/or is greater than a pressure of the organometallic starting material in the storage container and opening a second multiway valve so that the partial amount of the organometallic starting material partially flows as a gas into a process chamber.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
title | ALD Coating System and Method for Operating an ALD Coating System |
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