MOLD FOR STEP-AND-REPEAT IMPRINTING, AND METHOD FOR PRODUCING SAME
A step-and-repeat imprinting mold is provided that is capable of restraining deformation of an end of a convex and concave pattern formed in a cured resin layer when the mold is removed. According to embodiments of the present invention, a step-and-repeat imprinting mold includes: a transparent base...
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| creator | MIYAZAWA Yukihiro |
| description | A step-and-repeat imprinting mold is provided that is capable of restraining deformation of an end of a convex and concave pattern formed in a cured resin layer when the mold is removed. According to embodiments of the present invention, a step-and-repeat imprinting mold includes: a transparent base; a transparent resin layer formed thereon and having a pattern region formed with a convex and concave pattern; and a light shielding member provided between the transparent base and the transparent resin layer so as to overlap the pattern region in part of the pattern region. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2017157836A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2017157836A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2017157836A13</originalsourceid><addsrcrecordid>eNrjZHDy9fdxUXDzD1IIDnEN0HX0c9ENcg1wdQxR8PQNCPL0C_H0c9dRAAor-LqGePhDlAYE-buEOgNlFIIdfV15GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakl8aLCRgaG5oam5hbGZo6ExcaoAh7Er4w</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>MOLD FOR STEP-AND-REPEAT IMPRINTING, AND METHOD FOR PRODUCING SAME</title><source>esp@cenet</source><creator>MIYAZAWA Yukihiro</creator><creatorcontrib>MIYAZAWA Yukihiro</creatorcontrib><description>A step-and-repeat imprinting mold is provided that is capable of restraining deformation of an end of a convex and concave pattern formed in a cured resin layer when the mold is removed. According to embodiments of the present invention, a step-and-repeat imprinting mold includes: a transparent base; a transparent resin layer formed thereon and having a pattern region formed with a convex and concave pattern; and a light shielding member provided between the transparent base and the transparent resin layer so as to overlap the pattern region in part of the pattern region.</description><language>eng</language><subject>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR ; SHAPING OR JOINING OF PLASTICS ; TRANSPORTING ; WORKING OF PLASTICS ; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170608&DB=EPODOC&CC=US&NR=2017157836A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25551,76302</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170608&DB=EPODOC&CC=US&NR=2017157836A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MIYAZAWA Yukihiro</creatorcontrib><title>MOLD FOR STEP-AND-REPEAT IMPRINTING, AND METHOD FOR PRODUCING SAME</title><description>A step-and-repeat imprinting mold is provided that is capable of restraining deformation of an end of a convex and concave pattern formed in a cured resin layer when the mold is removed. According to embodiments of the present invention, a step-and-repeat imprinting mold includes: a transparent base; a transparent resin layer formed thereon and having a pattern region formed with a convex and concave pattern; and a light shielding member provided between the transparent base and the transparent resin layer so as to overlap the pattern region in part of the pattern region.</description><subject>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR</subject><subject>SHAPING OR JOINING OF PLASTICS</subject><subject>TRANSPORTING</subject><subject>WORKING OF PLASTICS</subject><subject>WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHDy9fdxUXDzD1IIDnEN0HX0c9ENcg1wdQxR8PQNCPL0C_H0c9dRAAor-LqGePhDlAYE-buEOgNlFIIdfV15GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakl8aLCRgaG5oam5hbGZo6ExcaoAh7Er4w</recordid><startdate>20170608</startdate><enddate>20170608</enddate><creator>MIYAZAWA Yukihiro</creator><scope>EVB</scope></search><sort><creationdate>20170608</creationdate><title>MOLD FOR STEP-AND-REPEAT IMPRINTING, AND METHOD FOR PRODUCING SAME</title><author>MIYAZAWA Yukihiro</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2017157836A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2017</creationdate><topic>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR</topic><topic>SHAPING OR JOINING OF PLASTICS</topic><topic>TRANSPORTING</topic><topic>WORKING OF PLASTICS</topic><topic>WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</topic><toplevel>online_resources</toplevel><creatorcontrib>MIYAZAWA Yukihiro</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MIYAZAWA Yukihiro</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>MOLD FOR STEP-AND-REPEAT IMPRINTING, AND METHOD FOR PRODUCING SAME</title><date>2017-06-08</date><risdate>2017</risdate><abstract>A step-and-repeat imprinting mold is provided that is capable of restraining deformation of an end of a convex and concave pattern formed in a cured resin layer when the mold is removed. According to embodiments of the present invention, a step-and-repeat imprinting mold includes: a transparent base; a transparent resin layer formed thereon and having a pattern region formed with a convex and concave pattern; and a light shielding member provided between the transparent base and the transparent resin layer so as to overlap the pattern region in part of the pattern region.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL |
| title | MOLD FOR STEP-AND-REPEAT IMPRINTING, AND METHOD FOR PRODUCING SAME |
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