TECHNIQUES FOR REDUCING DISTORTION OF OPTICAL BEAM SHAPING ELEMENTS
According to embodiments of the present invention, an apparatus comprising a beam shaping element (lens) is provided. The apparatus comprises a substrate; a beam shaping element; and an elastic intermediate layer disposed between, and in contact with, the substrate and the beam shaping element, wher...
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creator | Heimgartner Stephan Rossi Markus |
description | According to embodiments of the present invention, an apparatus comprising a beam shaping element (lens) is provided. The apparatus comprises a substrate; a beam shaping element; and an elastic intermediate layer disposed between, and in contact with, the substrate and the beam shaping element, wherein the elastic intermediate layer has a Young's Modulus in a range of 2-600 MPa and a Poisson's ratio in a range of 0.2-0.5. Techniques for reducing thermal distortion of lens are described. |
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The apparatus comprises a substrate; a beam shaping element; and an elastic intermediate layer disposed between, and in contact with, the substrate and the beam shaping element, wherein the elastic intermediate layer has a Young's Modulus in a range of 2-600 MPa and a Poisson's ratio in a range of 0.2-0.5. 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The apparatus comprises a substrate; a beam shaping element; and an elastic intermediate layer disposed between, and in contact with, the substrate and the beam shaping element, wherein the elastic intermediate layer has a Young's Modulus in a range of 2-600 MPa and a Poisson's ratio in a range of 0.2-0.5. Techniques for reducing thermal distortion of lens are described.</description><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHAOcXX28PMMDHUNVnDzD1IIcnUJdfb0c1dw8QwO8Q8K8fT3U_B3U_APCPF0dvRRcHJ19FUI9nAMAClx9XH1dfULCeZhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGhuaGxpaG5haOhsbEqQIA520siQ</recordid><startdate>20170518</startdate><enddate>20170518</enddate><creator>Heimgartner Stephan</creator><creator>Rossi Markus</creator><scope>EVB</scope></search><sort><creationdate>20170518</creationdate><title>TECHNIQUES FOR REDUCING DISTORTION OF OPTICAL BEAM SHAPING ELEMENTS</title><author>Heimgartner Stephan ; Rossi Markus</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2017139178A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2017</creationdate><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>Heimgartner Stephan</creatorcontrib><creatorcontrib>Rossi Markus</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Heimgartner Stephan</au><au>Rossi Markus</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>TECHNIQUES FOR REDUCING DISTORTION OF OPTICAL BEAM SHAPING ELEMENTS</title><date>2017-05-18</date><risdate>2017</risdate><abstract>According to embodiments of the present invention, an apparatus comprising a beam shaping element (lens) is provided. The apparatus comprises a substrate; a beam shaping element; and an elastic intermediate layer disposed between, and in contact with, the substrate and the beam shaping element, wherein the elastic intermediate layer has a Young's Modulus in a range of 2-600 MPa and a Poisson's ratio in a range of 0.2-0.5. Techniques for reducing thermal distortion of lens are described.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS |
title | TECHNIQUES FOR REDUCING DISTORTION OF OPTICAL BEAM SHAPING ELEMENTS |
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