PATTERN INSPECTION METHOD AND PATTERN INSPECTION APPARATUS

A pattern inspection method includes: scanning an inspection substrate, to be inspected, to detect a secondary electron group emitted from the inspection substrate due to irradiation with the multiple beams; correcting individually distortion of a first region image obtained from a detection signal...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: INOUE Takafumi, KIKUIRI Nobutaka
Format: Patent
Sprache:eng
Schlagworte:
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