Inspection Apparatus and Method Using Pattern Matching

To provide means according to which template matching is performed successfully in an apparatus that performs inspection or measurement of a semiconductor pattern, which is formed on a wafer, even in a case in which a pattern for alignment, which is in design data, has been eliminated from an image...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NAGATOMO Wataru, ABE Yuichi
Format:	Patent
Sprache:	eng
Schlagworte:	CALCULATING COMPUTING COUNTING HANDLING RECORD CARRIERS IMAGE DATA PROCESSING OR GENERATION, IN GENERAL PHYSICS PRESENTATION OF DATA RECOGNITION OF DATA RECORD CARRIERS
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