Target Expansion Rate Control in an Extreme Ultraviolet Light Source

A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target mater...

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Bibliographische Detailangaben

Hauptverfasser:	Rafac Robert Jay, Riggs Daniel Jason
Format:	Patent
Sprache:	eng
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY X-RAY TECHNIQUE
Online-Zugang:	Volltext bestellen
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