ARC DISCHARGE APPARATUS AND PLASMA PROCESSING SYSTEM INCLUDING THE SAME
An arc discharge apparatus includes a body unit including a housing and a transmissive member fixed to the housing, the housing having a coolant inlet and a coolant outlet, and an electrode unit on the housing, the electrode unit including an anode and a cathode facing each other, wherein the anode...
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| creator | HEO Jin-hwa KANG Sung-ho LEE Nam-hoon PARK Gi-nam KANG Gon-su JUNG Bo-kyung OH Byung-joo LEE Jong-hyun LEE Jin-seung KWON Hyeok-jun SEO Jung-woo KIM Tae-gon |
| description | An arc discharge apparatus includes a body unit including a housing and a transmissive member fixed to the housing, the housing having a coolant inlet and a coolant outlet, and an electrode unit on the housing, the electrode unit including an anode and a cathode facing each other, wherein the anode includes a main body portion connected to the housing, an anode tip coupled to the main body portion, and a cooling line in the anode and in contact with an inner wall of the anode tip, the cooling line being connected to the coolant inlet and to the coolant outlet. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2016358751A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2016358751A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2016358751A13</originalsourceid><addsrcrecordid>eNrjZHB3DHJWcPEMdvZwDHJ3VXAMCHAMcgwJDVZw9HNRCPBxDPZ1VAgI8nd2DQ729HNXCI4MDnH1VfD0c_YJdQEJhHi4KgQ7-rryMLCmJeYUp_JCaW4GZTfXEGcP3dSC_PjU4oLE5NS81JL40GAjA0MzY1MLc1NDR0Nj4lQBAH8MLXY</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ARC DISCHARGE APPARATUS AND PLASMA PROCESSING SYSTEM INCLUDING THE SAME</title><source>esp@cenet</source><creator>HEO Jin-hwa ; KANG Sung-ho ; LEE Nam-hoon ; PARK Gi-nam ; KANG Gon-su ; JUNG Bo-kyung ; OH Byung-joo ; LEE Jong-hyun ; LEE Jin-seung ; KWON Hyeok-jun ; SEO Jung-woo ; KIM Tae-gon</creator><creatorcontrib>HEO Jin-hwa ; KANG Sung-ho ; LEE Nam-hoon ; PARK Gi-nam ; KANG Gon-su ; JUNG Bo-kyung ; OH Byung-joo ; LEE Jong-hyun ; LEE Jin-seung ; KWON Hyeok-jun ; SEO Jung-woo ; KIM Tae-gon</creatorcontrib><description>An arc discharge apparatus includes a body unit including a housing and a transmissive member fixed to the housing, the housing having a coolant inlet and a coolant outlet, and an electrode unit on the housing, the electrode unit including an anode and a cathode facing each other, wherein the anode includes a main body portion connected to the housing, an anode tip coupled to the main body portion, and a cooling line in the anode and in contact with an inner wall of the anode tip, the cooling line being connected to the coolant inlet and to the coolant outlet.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161208&DB=EPODOC&CC=US&NR=2016358751A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161208&DB=EPODOC&CC=US&NR=2016358751A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HEO Jin-hwa</creatorcontrib><creatorcontrib>KANG Sung-ho</creatorcontrib><creatorcontrib>LEE Nam-hoon</creatorcontrib><creatorcontrib>PARK Gi-nam</creatorcontrib><creatorcontrib>KANG Gon-su</creatorcontrib><creatorcontrib>JUNG Bo-kyung</creatorcontrib><creatorcontrib>OH Byung-joo</creatorcontrib><creatorcontrib>LEE Jong-hyun</creatorcontrib><creatorcontrib>LEE Jin-seung</creatorcontrib><creatorcontrib>KWON Hyeok-jun</creatorcontrib><creatorcontrib>SEO Jung-woo</creatorcontrib><creatorcontrib>KIM Tae-gon</creatorcontrib><title>ARC DISCHARGE APPARATUS AND PLASMA PROCESSING SYSTEM INCLUDING THE SAME</title><description>An arc discharge apparatus includes a body unit including a housing and a transmissive member fixed to the housing, the housing having a coolant inlet and a coolant outlet, and an electrode unit on the housing, the electrode unit including an anode and a cathode facing each other, wherein the anode includes a main body portion connected to the housing, an anode tip coupled to the main body portion, and a cooling line in the anode and in contact with an inner wall of the anode tip, the cooling line being connected to the coolant inlet and to the coolant outlet.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHB3DHJWcPEMdvZwDHJ3VXAMCHAMcgwJDVZw9HNRCPBxDPZ1VAgI8nd2DQ729HNXCI4MDnH1VfD0c_YJdQEJhHi4KgQ7-rryMLCmJeYUp_JCaW4GZTfXEGcP3dSC_PjU4oLE5NS81JL40GAjA0MzY1MLc1NDR0Nj4lQBAH8MLXY</recordid><startdate>20161208</startdate><enddate>20161208</enddate><creator>HEO Jin-hwa</creator><creator>KANG Sung-ho</creator><creator>LEE Nam-hoon</creator><creator>PARK Gi-nam</creator><creator>KANG Gon-su</creator><creator>JUNG Bo-kyung</creator><creator>OH Byung-joo</creator><creator>LEE Jong-hyun</creator><creator>LEE Jin-seung</creator><creator>KWON Hyeok-jun</creator><creator>SEO Jung-woo</creator><creator>KIM Tae-gon</creator><scope>EVB</scope></search><sort><creationdate>20161208</creationdate><title>ARC DISCHARGE APPARATUS AND PLASMA PROCESSING SYSTEM INCLUDING THE SAME</title><author>HEO Jin-hwa ; KANG Sung-ho ; LEE Nam-hoon ; PARK Gi-nam ; KANG Gon-su ; JUNG Bo-kyung ; OH Byung-joo ; LEE Jong-hyun ; LEE Jin-seung ; KWON Hyeok-jun ; SEO Jung-woo ; KIM Tae-gon</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2016358751A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2016</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>HEO Jin-hwa</creatorcontrib><creatorcontrib>KANG Sung-ho</creatorcontrib><creatorcontrib>LEE Nam-hoon</creatorcontrib><creatorcontrib>PARK Gi-nam</creatorcontrib><creatorcontrib>KANG Gon-su</creatorcontrib><creatorcontrib>JUNG Bo-kyung</creatorcontrib><creatorcontrib>OH Byung-joo</creatorcontrib><creatorcontrib>LEE Jong-hyun</creatorcontrib><creatorcontrib>LEE Jin-seung</creatorcontrib><creatorcontrib>KWON Hyeok-jun</creatorcontrib><creatorcontrib>SEO Jung-woo</creatorcontrib><creatorcontrib>KIM Tae-gon</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HEO Jin-hwa</au><au>KANG Sung-ho</au><au>LEE Nam-hoon</au><au>PARK Gi-nam</au><au>KANG Gon-su</au><au>JUNG Bo-kyung</au><au>OH Byung-joo</au><au>LEE Jong-hyun</au><au>LEE Jin-seung</au><au>KWON Hyeok-jun</au><au>SEO Jung-woo</au><au>KIM Tae-gon</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ARC DISCHARGE APPARATUS AND PLASMA PROCESSING SYSTEM INCLUDING THE SAME</title><date>2016-12-08</date><risdate>2016</risdate><abstract>An arc discharge apparatus includes a body unit including a housing and a transmissive member fixed to the housing, the housing having a coolant inlet and a coolant outlet, and an electrode unit on the housing, the electrode unit including an anode and a cathode facing each other, wherein the anode includes a main body portion connected to the housing, an anode tip coupled to the main body portion, and a cooling line in the anode and in contact with an inner wall of the anode tip, the cooling line being connected to the coolant inlet and to the coolant outlet.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | ARC DISCHARGE APPARATUS AND PLASMA PROCESSING SYSTEM INCLUDING THE SAME |
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