SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME

A semiconductor device is disclosed. The device includes a substrate including an active region defined by a device isolation layer, a fin pattern protruding from the substrate and extending in a first direction, the fin pattern including a gate fin region and a source/drain fin region, a gate patte...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: JUNG Sujin, LEE KWAN HEUM, LEE BYEONGCHAN, MOON KANG HUN, XU Yang, KIM JinBum, LEE Choeun
Format: Patent
Sprache:eng
Schlagworte:
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