Computationally Efficient X-ray Based Overlay Measurement

Methods and systems for performing overlay and edge placement errors of device structures based on x-ray diffraction measurement data are presented. Overlay error between different layers of a metrology target is estimated based on the intensity variation within each x-ray diffraction order measured...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Shchegrov Andrei V, Hench John, Bakeman Michael S
Format:	Patent
Sprache:	eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
Online-Zugang:	Volltext bestellen
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