SUBSTRATE FOR SOLIDIFYING A SILICON INGOT

A substrate, in particular intended for contact with liquid silicon, wherein it is at least partially surface-coated with a multilayer coating formed by: at least one layer, known as the adhesion layer, contiguous with the substrate, having an open porosity of at least 30%, and formed of a material...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: EUSTATHOPOULOS Nicolas, HUGUET Charles, TESTARD Johann, GARANDET Jean-Paul, DREVET Béatrice, CAMEL Denis, VOYTOVYCH Rayisa
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A substrate, in particular intended for contact with liquid silicon, wherein it is at least partially surface-coated with a multilayer coating formed by: at least one layer, known as the adhesion layer, contiguous with the substrate, having an open porosity of at least 30%, and formed of a material comprising silica and silicon nitride, said material having a silica content of between 10 wt.-% and 55 wt.-% in relation to the total weight thereof; and a layer different from the adhesion layer, known as the release layer, located on the surface of the adhesion layer and formed of a material including silica and silicon nitride, said material having a silica content of between 2 wt.-% and 10 wt.-% in relation to the total weight thereof.