CONVEYING APPARATUS

A conveying apparatus includes a holding plate having a holding surface destined to face a surface of a wafer to be held; a restriction member on one end side of the holding surface adapted to contact the periphery of the wafer so as to restrict movement of the wafer; and a moving unit adapted to mo...

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Hauptverfasser: BIN WU, YAMADA SHOJIRO, MIKAMI KODAI
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creator BIN WU
YAMADA SHOJIRO
MIKAMI KODAI
description A conveying apparatus includes a holding plate having a holding surface destined to face a surface of a wafer to be held; a restriction member on one end side of the holding surface adapted to contact the periphery of the wafer so as to restrict movement of the wafer; and a moving unit adapted to move the holding plate. At the holding surface, a non-contact type suction holding part is adapted to jet a fluid obliquely to the surface of the wafer to be held so as to move the wafer toward the restriction member and generate a negative pressure between the holding surface and the surface to be held, thereby holding the wafer by suction. The fluid is jetted from the suction holding part so as to abut the wafer against the restriction member, thereby positioning the wafer at a predetermined position on the holding plate.
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subjects BASIC ELECTRIC ELEMENTS
CHAMBERS PROVIDED WITH MANIPULATION DEVICES
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
HAND TOOLS
MANIPULATORS
PERFORMING OPERATIONS
PORTABLE POWER-DRIVEN TOOLS
SEMICONDUCTOR DEVICES
TRANSPORTING
title CONVEYING APPARATUS
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