FCVD LINE BENDING RESOLUTION BY DEPOSITION MODULATION

A method of reducing line bending and surface roughness of a substrate with pillars includes forming a treated surface by treating a pillar-containing substrate with a radical. The radical may be silicon-based, nitrogen-based or oxygen-based. The method may include forming a dielectric film over the...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	THADANI KIRAN V, RAJAGOPALAN NAGARAJAN, LIANG JINGMEI, KACHIAN JESSICA S
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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