METROLOGY METHOD AND APPARATUS

A method to determine an overlay error between a first structure and a second structure, wherein the first structure and second structures are on different layers on a substrate and are imaged onto the substrate by a lithographic process, the method comprising: obtaining an apparent overlay error; o...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HUANG TEIH, LU YEN-WEN, LIU WEI, CHEN JAY JIANHUI, WANG JEN-SHIANG, MENCHTCHIKOV BORIS
Format:	Patent
Sprache:	eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING
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